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Titanium Aluminum Sputtering Target

Target,cathodes,Titanium Aluminum target,Titanium Aluminum ca

Product Name

Titanium Aluminum Sputtering Target

Element Symbol

Ti + Al


2N5, 3N

Availble Shape

Planar sputtering targets, arc cathodes


We manufacture Titanium Aluminum sputtering targets and cathodes for tool coating and decorative coating, to obtain golden brown and brownish black color thin film. Sputtering target alloy composition include TiAl 50/50 at%, TiAl 65/35at%, TiAl 70/30at%, TiAl 75/25at%, TiAl 80/20at%, TiAl 90/10at%, special alloy can be customized according to customer’s requirement.
Titanium Aluminum sputtering targets are manufactured by hot isostatic pressure technology, the grain size is smaller than 100um, we can ensure the TiAl sputtering targets or cathodes uniform and compact inner structure, tiny titanium particles were uniformly distributed in aluminum base.


The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two micrographs of our Titanium Aluminum (30/70 at%)sputtering target, the average grain size<100μm.


The sputtering targets we produced are high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 2N8 high purity Titanium Aluminum (30/70 at%) sputtering target.
Analytical Methods: 1. Metallic elements were analyzed using ICP-OES. 2. Gas elements were analyzed using LECO. 

Besides, our plant is also specialized in manufacturing TiAlSi sputtering target / cathodes, TiSi sputtering target / cathodes, AlCr sputtering target / cathodes, Chromium sputtering target / cathodes for tool coating and decorative coating, pls contact us for more information.

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