Nickel Vanadium Sputtering Target
Ni + V
3N, 3N6, 4N
Planar target, Rotary target
The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two micrographs of our nickel vanadium (93/7wt%) alloy sputtering target, the average grain size＜100μm.
The sputtering targets we produced are high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 3N5 high purity nickel vanadium (93/7wt%) alloy sputtering target.Analytical Methods: 1. Metallic elements were analyzed using ICP-OES. 2. Gas elements were analyzed using LECO.
Significantly, our plant is also specialized in manufacturing various Nickel based alloy sputtering targets, including Ni + Al, Ni + Co, Ni + Cu, Ni + W, Ni + Cr + Si, Ni + W + Cr alloy sputtering targets, with customized alloy compositions, flexible dimension with closer tolerance, as well as uniform microstructure. If any of our products are interesting to you, please contact us without hesitating.