Welcome to Changsha Xinkng Advanced MaterialsCo.,Ltd,a professional producer of sputtering targets

Aluminum Sputtering Target

Aluminum Target,sputtering target,Al target,Al-Si alloy targe

Product Name

Aluminum Sputtering Target

Element Symbol

Al

Purity

4N, 5N, 5N5

Availble Shape

Planar target, Rotary target


Process


Micrograph

he flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two micrographs of our aluminum sputtering target, the average grain size<300μm.
                          

















Analysis

The sputtering targets we produced are high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 5N high purity aluminum sputtering target.
Analytical Methods: 1. Metallic elements were analyzed using GDMS. 2. Gas elements were analyzed using LECO.


                                           

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