Welcome to Changsha Xinkng Advanced MaterialsCo.,Ltd,a professional producer of sputtering targets

Cobalt Sputtering Target

Cobalt Target,Co Target,sputtering target

Product Name

Cobalt Sputtering Target

Element Symbol

Co

Purity

3N5

Availble Shape

Planar target, Rotary target


Process


Micrograph

The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two micrographs of our cobalt sputtering target, the average grain size<100μm.
















Analysis

The sputtering targets we produced are high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 3N6 high purity cobalt sputtering target.
Analytical Methods: 1. Metallic elements were analyzed using GDMS or ICP-OES. 2. Gas elements were analyzed using LECO.
 


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