Cobalt Sputtering Target
Planar target, Rotary target
The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two micrographs of our cobalt sputtering target, the average grain size＜100μm.
Analytical Methods: 1. Metallic elements were analyzed using GDMS or ICP-OES. 2. Gas elements were analyzed using LECO.