Welcome to Changsha Xinkng Advanced MaterialsCo.,Ltd,a professional producer of sputtering targets

Molybdenum Sputtering Targets

Molybdenum,sputtering target,s

Product Name

Molybdenum Sputtering Targets

Element Symbol

Mo

Purity

3N5

Availble Shape

Planar target, Rotary target


Process


XK is specialized in manufacturing pure Molybdenum sputtering targets with various shapes, such as planar disc, plate, sheet, wire, as well as rotary tubes, which are widely applied to semi-conductive & micro-electronics, flat panel display, and solar photovoltaic. Thanks to the special forming processes we used, our Molybdenum sputtering targets possess higher density and smaller average particle size, so that you can benefit from a faster process due to higher sputtering speeds.

Micrograph

The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two typical micrographs of our Molybdenum sputtering target, the average grain size<100μm.
















Analysis

The chemical purity is crucial to a metal sputtering targets, if the purity is higher, the films you obtained possess an more outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 3N5 high purity Molybdenum sputtering target.
Analytical Methods: 1. Metallic elements were analyzed using ICP-OES. 2. Gas elements were analyzed using LECO. 




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