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Niobium Sputtering Target

Niobium,Sputtering Target,,spu

Product Name

Niobium Sputtering Target

Element Symbol



3N, 3N5, 4N

Availble Shape

Planar target, Rotary target


XK is a professional producer of Niobium sputtering targets with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics industry. Thanks to the special forming processes we used, our Niobium sputtering targets possess higher density, smaller average particle size as well as high purity, as a result, you can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous Niobium layers.


The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two typical micrographs of our Niobium sputtering target, the average grain size<100μm.


The chemical purity is crucial to a metal sputtering targets, if the purity is higher, the films you obtained possess an more outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 3N5 high purity Niobium sputtering target.
Analytical Methods: 1. Metallic elements were analyzed using ICP-OES. 2. Gas elements were analyzed using LECO.

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