Welcome to Changsha Xinkng Advanced MaterialsCo.,Ltd,a professional producer of sputtering targets

Vanadium Sputtering Target

Vanadium,sputtering target,spu

Product Name

Vanadium Sputtering Target

Element Symbol



2N5, 3N

Availble Shape

Planar target, Rotary target



The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two micrographs of our vanadium sputtering target, the average grain size<100μm.


The sputtering targets we produced are high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 3N high purity vanadium sputtering target.
Analytical Methods: 1. Metallic elements were analyzed using  ICP-OES. 2. Gas elements were analyzed using LECO. 

Related Products