The effect of sputtering target's grain size on the sputtering，The smaller the grain size of the sputtering target, the larger the grain boundary area and the greater the impact on performance.

Magnetron sputtering is developed on the basis of two-pole sputtering. A magnetic field orthogonal to the electric field is established on the surface of the target, which solves the problems of low deposition rate of two-pole sputtering and low plasma ionization rate. It has become the mainstay of the coating industry. One of the methods.

Magnetron sputtering target poisoning treatment method, the target with intermediate frequency source or RF source hit one or two hours, can be recovered; the target removed, with sandpaper polishing, can also be solved.

Determine the target material and gas type, and then adjust its various parameters to prepare a color film

Magnetron sputtering is a kind of physical vapor deposition. Magnetron sputtering increases the plasma density and sputtering rate by introducing a magnetic field on the cathode surface of the target... ...

Physical vapor deposition (PVD) is a thin film preparation technology, and the materials used to prepare thin film materials are called PVD thin film targets and sputtering targets.

Ultra-high purity metal sputtering targets are an important part of electronic materials. At present, high-purity sputtering target products are mainly used in the semiconductor industry, flat panel display industry and solar cell industry.

From the perspective of process manufacturing, sputtering target material and evaporation material, the manufacturing complexity of evaporation material is much lower than that of sputtering target material, and evaporation coating is often used for coating small-sized substrate materials.

The application fields of high-purity sputtering targets mainly include semiconductors, panels, photovoltaics and optical devices.

The sputtering target is mainly composed of a target blank, a backing plate, etc., among which the backing plate mainly serves to fix the sputtering target.

Sputtering target is an ancient process of physical vapor deposition technology. The final product is a thin and durable film suitable for various applications.

Xinkang New Material Co., Ltd. is an expert in customizing/manufacturing sputtering targets.

Sputtering target is one of the core materials for semiconductor fabrication. Xinkang is a leading supplier of customized coated target materials.

Recently, the high-tech enterprise certification management network announced that Hunan Changsha Xinkang New Material Technology Co., Ltd.

Xinkang can customize various sputtering target materials, including various parts from industrial grade to ultra-high purity.