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What is the role of sputtering target

The sputtering target was first discovered in 1852 and was developed as a thin film deposition technology in 1920. It is an ancient process of physical vapor deposition technology, but has many uses in modern technology and manufacturing. The process begins by feeding the substrate (or other items to be coated) into a vacuum chamber containing two magnets. After a controlled gas (such as argon) is introduced into the chamber, a powerful magnet pulls atoms from the substrate. These atoms then collide with each other in a gaseous form, and then condense into plasma, which dries into a thin film on the substrate. The final product is a thin and durable film suitable for various applications.

What is the role of sputtering target

Sputtering target application field
Many commonly used products today have thin films formed by sputtering targets.

· Semiconductor
Most modern electronic products contain the necessary components produced with tantalum sputtering targets. These include microchips, memory chips, print heads, flat panel displays and others.

· Glass coating
Sputtering targets are used to produce low-emissivity coated glass (also known as Low-E glass), which is often used in building structures due to its energy saving, light control and aesthetic capabilities.

· Solar cell coating
The demand for renewable energy is rising. The third-generation thin-film solar cells are prepared using sputtering coating technology.

The sputtering targets provided by Xinkang each have the most suitable different applications. The most common ones include:
· Tantalum Sputtering Target
Tantalum is used as a barrier layer on silicon wafers for semiconductor production, and tantalum is used in all modern electronic products. Cell phones, DVD and Blu-ray players, laptops, automotive electronics and even game consoles all contain tantalum.

· Niobium Sputtering Target
Niobium is commonly used in electronic products and its properties are similar to tantalum. Niobium has corrosion resistance due to its oxide film and is considered a superconductor.

· Titanium sputtering target
Titanium has the characteristics of light weight and corrosion resistance, and can be used in various conventional products including watches, notebook computers and bicycles. This material is commonly used for wear resistance and aesthetic design, but can also be used for semiconductor and optical coatings.

· Tungsten sputtering target
Tungsten film is a decorative coating that is widely used due to its thermal, physical and mechanical properties (such as high melting point and thermal conductivity).

· Molybdenum Sputtering Target
This element has a lower density and a consistent price, and can be used instead of tungsten. It is usually used to coat solar panels.

· Hafnium Sputtering Target
It is often used as an insulator for semiconductors, as well as surface hardness and protective layer. As an element with a high dielectric constant, it can improve the performance of certain electronic devices.

· Silicon sputtering target
This target material is most commonly used in the production of silicon solar cells.

More details about sputtering targets... ...

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sputtering target backing plate