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The difference between sputtering target and evaporation material

PVD technology is one of the main technologies for preparing thin film materials, and the materials used to prepare thin film materials are called PVD coating materials. After years of development, PVD coating technology has been widely used in electronics, optics, machinery, construction, materials and other fields.

Sputtering coating and vacuum evaporation coating are the two most mainstream PVD coating methods.

Sputtering (Sputtering) coating technology uses the ions generated by the ion source to accelerate and accumulate in a high vacuum to form a high-speed energy ion beam, bombard the solid surface, and exchange kinetic energy between the ions and the atoms on the solid surface. It leaves the solid and deposits on the surface of the substrate to form a thin film material. The bombarded solid raw material is the raw material used to deposit thin films by sputtering, which is called sputtering target.

The sputtering target material has the characteristics of high purity, high density, multi-component, uniform crystal grain, etc., and is generally composed of a target blank and a backing plate.

According to the different raw materials used, sputtering targets can be divided into metal/non-metal elementary targets, alloy targets, compound targets, etc. The sputtering coating process has good repeatability and controllable film thickness. A thin film with uniform thickness can be obtained on a large-area substrate material. The prepared film has the advantages of high purity and good density. It has become one of the main techniques for preparing thin film materials. 1. Sputtering targets have also become the most widely used PVD coating material on the market.

Ultra-high purity metals and sputtering targets are important components of electronic materials. The sputtering target industry chain mainly includes metal purification, target manufacturing, sputtering coating and terminal applications. Among them, target manufacturing and sputtering coating Link is a key link in the entire sputtering target industry chain.

The target manufacturing process first needs to design the process according to the performance requirements of the downstream application field, and then perform repeated plastic deformation and heat treatment to control key indicators such as crystal grains and crystal orientation. Ultrasonic cleaning and other processes.



Vacuum evaporation coating and evaporation materials

Vacuum evaporation coating refers to a technology in which a thin film is obtained by heating and evaporating a substance by an evaporation source to deposit it on the surface of the substrate material under vacuum conditions. The vaporized material is called vapor deposition material.

The vacuum evaporation coating system generally consists of three parts: vacuum chamber, evaporation source or evaporation heating device, substrate placement and substrate heating device. In order to evaporate the material to be deposited in a vacuum, a container is needed to support or contain the evaporate, and at the same time, it is necessary to provide evaporation heat to make the evaporate reach a high enough temperature to generate the required vapor pressure.

Vacuum evaporation coating technology has the characteristics of simplicity, convenience, convenient operation, and fast film formation speed. It is a widely used coating technology, mainly used in the coating of optical components, LEDs, flat panel displays and semiconductor discretes. Vacuum coating materials can be divided into metal/non-metal particle evaporation materials, oxide evaporation materials, fluoride evaporation materials, etc. according to their chemical composition.

The main process flow of evaporation materials includes mixing, raw material pretreatment, molding, sintering and testing.


Comparison of sputtering coating and evaporation coating
the sputtering coating process has good repeatability and controllable film thickness, and a thin film with uniform thickness can be obtained on a large area substrate material. The prepared thin film has high purity, good density, and the substrate Advantages such as strong bonding force of materials. Evaporation coating is simple and convenient, easy to operate, and fast in film formation. From the perspective of process manufacturing, the manufacturing complexity of evaporation materials is much lower than that of sputtering targets, and evaporation coatings are often used for coating small-sized substrate materials.




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High purity metal sputtering target