For planar targets, the main advantages are simple structure, strong versatility, and good film uniformity and repeatability. Its biggest disadvantage is the low utilization rate of the target material, generally only about 20%; when the target material in the glow area (magnetic field distribution area) is consumed to a certain extent, strip-shaped pits will be formed, making the target body thinner; When the pit depth reaches a certain value, the target can no longer be used.
For rotating targets, compared with flat targets, its main advantages are compact structure and higher target utilization, which means that rotating targets can solve the problem of low utilization of flat targets. However, rotating targets also have some unavoidable shortcomings. There are many glow rings on the entire target surface during sputtering, which cannot form a continuous ribbon glow. Therefore, when coating a large-area film layer, the uniformity of the film layer surface is poor, and it is difficult to meet the requirements. This is the biggest shortcoming of the rotating target.
From the above content, we know that the two shapes of targets have their own advantages and disadvantages. On the one hand, the performance of different target shapes is related to specific preparation projects and products; on the other hand, people are trying to develop new types of targets that have the advantages of both planar and rotating targets, such as cylindrical targets.
If you are still confused about which sputtering target to choose, you can contact us. Changsha Xinkang New Materials Co., Ltd. is a global supplier of various sputtering target materials such as metals, alloys, oxides, and ceramic materials. We promise to provide you with satisfactory service.