Welcome to Changsha Xinkng Advanced MaterialsCo.,Ltd,a professional producer of sputtering targets
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Changsha Xinkng Advanced MaterialsCo.,Ltd Pure Metal Targets
Pure Metal Targets

Changsha Xinkang Advanced Materials Co.,Ltd is a professional producer of PVD coating materials, we engaged in producing and suppling the most suitable and high quality metal sputtering targets,metal alloy sputtering targetsceramic sputtering targets and evaporation materials, for the field of semiconductor and micro-electronics, optical glass coating, decoration, solar photovoltaic coating and flat panel display.

We can produce and supply most of the metal materials on the periodic table, including rare earth metals. We generally use the production process of vacuum melting and hot pressing. By controlling the technical parameters of the processes of forging, rolling and annealing, the finished sputtering target has the characteristics of high density, low gas content, uniform internal structure, the end user can obtain constant erosion rates and high pure and homogeneous thin films during PVD process. 

The sputtering targets purity can be 99% to 99.999%, different from metals. The shape can be round, rectangle, cathode and rotary tube, and also produced per the drawing supplied by customer. 

We have listed some of the conventional metal targets in the table below. You can learn  more information about each materials by clicking " View Details", such as finished targets picture,  production process, purity range, material characteristics, sputtering target application, Internal microstructure and typical analysis report.

If the material you are looking for is not listed below, it does not mean that we can't provide it. Please be sure to contact us by email or phone, and we will give you an accurate reply within 24 hours.

Pure Metal Targets List
Product Name Element Symbol Purity Shape Detail
Vanadium Sputtering Target V 2N5, 3N Planar target, Rotary target
Iron Sputtering Target Fe 3N, 3N5, 4N Planar target, Rotary target
Cobalt Sputtering Target Co 3N5 Planar target, Rotary target
Silver sputtering target Ag 4N, 4N5 Planar sputtering target, Rotary sputtering target
Molybdenum Sputtering Targets Mo 3N5 Planar target, Rotary target
Niobium Sputtering Target Nb 3N, 3N5 Planar target, Rotary target
Tantalum Sputtering Target Ta 3N5, 4N, 4N5 Planar target, Rotary target
Tungsten Sputtering Target W 3N5 Planar target, Rotary target
Nickel Sputtering Target Ni 3N, 3N6, 4N, 4N5, 5N Planar target, Rotary target
Titanium Sputtering Target Ti 3N, 4N, 4N5, 5N Planar target, Rotary target
Aluminum Sputtering Target Al 4N, 5N, 5N5 Planar target, Rotary target
Chromium Sputtering Target / Arc cathodes Cr 2N5, 3N, 3N5 Planar targets, rotary targets, acr cathode
Copper Sputtering Target Cu 4N, 5N, 6N Planar target, Rotary target
Silicon Sputtering Target Si 5N, 6N Planar target, Rotary target
Gold Sputtering Target Au 4N, 5N Planar
Germanium Sputtering Target Ge 5N, 6N Planar
Yttrium Sputtering Target Y 3N, 4N Planar
Scandium Sputtering Target Sc 3N, 4N Planar
Zirconium Sputtering Target Zr Zr + Hf ≥ 99.4%, Zr + Hf ≥ 99.95% Planar, Rotary
Hafnium Sputtering Target Hf Hf + Zr ≥99.95% Planar
Zinc Sputtering Target Zn 4N Planar
Rhenium Sputtering Target Re 4N Planar
Ruthenium Sputtering Target Ru 3N5 Planar
Platinum Sputtering Target Pt 3N5 Planar