Changsha Xinkang Advanced Materials Co.,Ltd is a professional producer of PVD coating materials, we engaged in producing and suppling the most suitable and high quality metal sputtering targets,metal alloy sputtering targets, ceramic sputtering targets and evaporation materials, for the field of semiconductor and micro-electronics, optical glass coating, decoration, solar photovoltaic coating and flat panel display.
We can produce and supply most of the metal materials on the periodic table, including rare earth metals. We generally use the production process of vacuum melting and hot pressing. By controlling the technical parameters of the processes of forging, rolling and annealing, the finished sputtering target has the characteristics of high density, low gas content, uniform internal structure, the end user can obtain constant erosion rates and high pure and homogeneous thin films during PVD process.
The sputtering targets purity can be 99% to 99.999%, different from metals. The shape can be round, rectangle, cathode and rotary tube, and also produced per the drawing supplied by customer.
We have listed some of the conventional metal targets in the table below. You can learn more information about each materials by clicking " View Details", such as finished targets picture, production process, purity range, material characteristics, sputtering target application, Internal microstructure and typical analysis report.
If the material you are looking for is not listed below, it does not mean that we can't provide it. Please be sure to contact us by email or phone, and we will give you an accurate reply within 24 hours.
|Product Name||Element Symbol||Purity||Shape||Detail|
|Vanadium Sputtering Target||V||2N5, 3N||Planar target, Rotary target|
|Iron Sputtering Target||Fe||3N, 3N5, 4N||Planar target, Rotary target|
|Cobalt Sputtering Target||Co||3N5||Planar target, Rotary target|
|Silver sputtering target||Ag||4N, 4N5||Planar sputtering target, Rotary sputtering target|
|Molybdenum Sputtering Targets||Mo||3N5||Planar target, Rotary target|
|Niobium Sputtering Target||Nb||3N, 3N5||Planar target, Rotary target|
|Tantalum Sputtering Target||Ta||3N5, 4N, 4N5||Planar target, Rotary target|
|Tungsten Sputtering Target||W||3N5||Planar target, Rotary target|
|Nickel Sputtering Target||Ni||3N, 3N6, 4N, 4N5, 5N||Planar target, Rotary target|
|Titanium Sputtering Target||Ti||3N, 4N, 4N5, 5N||Planar target, Rotary target|
|Aluminum Sputtering Target||Al||4N, 5N, 5N5||Planar target, Rotary target|
|Chromium Sputtering Target / Arc cathodes||Cr||2N5, 3N, 3N5||Planar targets, rotary targets, acr cathode|
|Copper Sputtering Target||Cu||4N, 5N, 6N||Planar target, Rotary target|
|Silicon Sputtering Target||Si||5N, 6N||Planar target, Rotary target|
|Gold Sputtering Target||Au||4N, 5N||Planar|
|Germanium Sputtering Target||Ge||5N, 6N||Planar|
|Yttrium Sputtering Target||Y||3N, 4N||Planar|
|Scandium Sputtering Target||Sc||3N, 4N||Planar|
|Zirconium Sputtering Target||Zr||Zr + Hf ≥ 99.4%, Zr + Hf ≥ 99.95%||Planar, Rotary|
|Hafnium Sputtering Target||Hf||Hf + Zr ≥99.95%||Planar|
|Zinc Sputtering Target||Zn||4N||Planar|
|Rhenium Sputtering Target||Re||4N||Planar|
|Ruthenium Sputtering Target||Ru||3N5||Planar|
|Platinum Sputtering Target||Pt||3N5||Planar|