Changsha Xinkang Advanced Materials Co.,Ltd Metal Sputtering Targets Vanadium Sputtering Target
Vanadium Sputtering Target
Vanadium Sputtering Target
Attributes Name
High purity metal sputtering target
Product Name
Vanadium Sputtering Target
Element Symbol
2N5, 3N
Planar target, Rotary target
Vanadium(V)Sputtering Target Description

Vanadium(V)sputtering target shares properties with its source material. Vanadium is a chemical element with symbol V and atomic number 23. It is a hard, silvery-grey, ductile, malleable transition metal. The elemental metal is rarely found in nature, but once isolated artificially, the formation of an oxide layer (passivation) somewhat stabilizes the free metal against further oxidation.Vanadium is electrically conductive and thermally insulating, and it’s harder than most metals and steel. It has good resistance to corrosion and it is stable against alkalis and sulfuric and hydrochloric acids. It is oxidized in air at about 933 K(660 °C, 1220 °F), although an oxide passivation layer forms even at room temperature.

Vanadium Sputtering Target is produced by melting technology. Because vanadium oxide has very special optical and electric properties, it can be applied for Infrared intelligent window, electro-optic switch device, and as laser protection materials and stealth material. With up to 3N purity and special annealing treatment, uniform grain size as well as lower gas content, end user can obtain constant erosion rates and high pure and homogeneous thin film coating during PVD process.

The picture below are two micrographs of our vanadium sputtering target, the average grain size<100μm.

Our high purity sputtering target can make the film possess an outstanding level of electrical conductivity and minimize the particle formation during the PVD process. Following is a typical certificate of analysis for 3N vanadium sputtering target.

Analytical Methods:
1. Metallic elements were analyzed by GDMS and ICP-OES.
2. Gas elements were analyzed by LECO.

High purity vanadium sputtering target


Preparation process of vanadium sputtering target
Materials - EB - Analysis - Forging - Rolling - Annealing - Micrograph - Machining - Measurement - Cleaning - Inspection - Package 

Vanadium alloy sputtering target series
Aluminum molybdenum vanadium, aluminum tin titanium vanadium, aluminum vanadium, cobalt vanadium, iron vanadium, nickel vanadium alloy targets, etc.

Vanadium compound series
Vanadium boride, vanadium carbide, vanadium silicide, vanadium nitride, vanadium pentoxide, etc.

Iron Sputtering Target