Changsha Xinkang Advanced Materials Co.,Ltd Metal Sputtering Targets Chromium Sputtering Target
Chromium Sputtering Target
Chromium Sputtering Target
Attributes Name
High purity metal sputtering target
Product Name
Chromium Sputtering Target
Element Symbol
2N5, 3N, 3N5
Planar targets, rotary targets, acr cathode
Chromiumn(Cr)Sputtering Target Description

Chromium sputtering target has the same properties as metal chromium (Cr),Chromium is a chemical element with the symbol Cr and atomic number 24, it is a steely-grey, lustrous, hard and brittle transition metal. Chromium is also the main additive in stainless steel, to which it adds anti-corrosive properties. Chromium sputtering targets and chromium cathodes are usually used for decorative coating and tool coating.

When chromium target is used for depositing a decorative coating, chromium thin film can make an attractive sheen on watches, electronic goods, operating elements on appliances and a range of other products . Decorative chromium coatings are applied by the magnetron sputtering method. Wear resistant and adhesive layers can also be produced by the arc evaporation method.

The hard material coatings chromium (Cr) and chromium nitride (CrN) optimally protect engine components such as piston rings,to against premature wear and consequently extend the useful life of important engine parts. Chromium is also used as a bonding layer for DLC coatings (Diamond Like Carbon), for example on bucket tappets.

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The microstructure can be adjusted by our flexibility production process, to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The pictures below are two micrographs of our chromium sputtering target, the average grain size<100μm.

Our chromium sputtering target is high purity, the most important benefit is that the films will possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Following is a typically Certificate of analysis for 3N5 chromium sputtering target.

Analytical Methods:
1. Metallic elements were analyzed by GDMS and ICP-OES.
2. Gas elements were analyzed by LECO.


Besides, we also supply Titanium Sputtering Cathodes, Zirconium Sputtering Cathodes, Titanium Aluminium TiAl Sputtering Cathodes, TiAlSi, TiSi cathodes for decorative and tool coating, contact us for more details.

Other alloy forms of chromium sputtering target
Molybdenum chromium, chromium zirconium, chromium manganese, chromium nickel alloy sputtering target, etc.

Aluminum Sputtering Target
Copper Sputtering Target