The indium sputtering target is a silver glossy gray target composed of high-purity indium (In). Its melting point is 156.61°C, boiling point is 2060°C, and density is 7.3 g/cm3. The texture is very soft, can be scored with nails, has strong plasticity, is malleable, can be pressed into sheets, and is a fusible metal. One of its distinguishing features is its ability to adhere to glass and other similar surfaces. Indium compounds evaporate under vacuum to form thin films in the production of electronic products and photovoltaic cells. Pure indium is used as a thin film layer in semiconductors.

Manufacturing process of indium sputtering target
Preparation-Melting-Chemical Analysis-Forging-Rolling-Annealing-Metallographic Inspection-Machining-Dimensional Inspection-Cleaning-Final Inspection-Packaging

Indium sputtering target is a silver glossy gray target, Its melting point is 156.61°C, boiling point is 2060°C, and density is 7.3 g/cm3. Indium is very soft and can be scored with nails, it is malleable and can be pressed into sheets, it is a fusible metal. One of its distinguishing features is its ability to adhere to glass and other similar surfaces. Indium compounds evaporate under vacuum to form thin films in the production of electronic products and photovoltaic cells. Pure indium is used as a thin film layer in semiconductors.


Application of indium sputtering target
Indium sputtering target is used to coat the bearings of high-speed motors because it can evenly distribute the lubricant. Indium targets are also used in thin film deposition, decoration, semiconductors, displays, LED and photovoltaic devices, functional coatings, and other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, and optical communications.

Indium is also used to make other electrical components such as rectifiers, thermistors and photoconductors. Indium can be used to make mirrors that have the same reflectivity as silver mirrors but will not fade. Indium is also used to make low melting point alloys. The alloy of 24% indium and 76% gallium is liquid at room temperature.

Following is a typically Certificate of analysis of 4N Indium Sputtering Target.


Analytical Methods:
1. Metallic elements were analyzed by ICP-OES;
2. Gas elements were analyzed by LECO.