Changsha Xinkng Advanced MaterialsCo.,Ltd Metal Sputtering Targets Hafnium Sputtering Target
Hafnium Sputtering Target
Hafnium Sputtering Target
Attributes Name
High purity metal sputtering target
Product Name
Hafnium Sputtering Target
Element Symbol
Hf
Purity
3N
Shape
Plane target,customized
Hafnium(Hf)Sputtering Target Description


Hafnium sputtering target has the same performance as metal hafnium (Hf). Hafnium with melting point of 2233°C, boiling point of 4603°C, and density of 13.31g/cm3. It is a shiny silver-gray transition metal. Metal hafnium has moderate strength, good corrosion resistance, and high neutron absorption capacity. It is widely used in the atomic energy industry; hafnium can form a variety of alloys and can also be used as a surface coating for base metals. We can provide imported high-purity hafnium with low-zirconium, which can be processed into targets and particles.


Application of hafnium sputtering target
By introducing the partial pressure of oxygen, the hafnium oxide film can be prepared by electric sputtering or reactive sputtering with hafnium sputtering target. The resulting thin film can be used in a variety of applications, including optical coatings for photonics, thin film resistance, corrosion resistance, nuclear products, gate insulators in integrated circuits, and sensors.

Following is a typically Certificate of analysis of 3N5 Hafnium Sputtering Target.
Analytical Methods:
1. Metallic elements were analyzed by ICP-OES;
2. Gas elements were analyzed by LECO.


Hafnium Sputtering Target




Indium sputtering target