Changsha Xinkng Advanced MaterialsCo.,Ltd Alloy Sputtering Target Tungsten Titanium Sputtering Targets
Tungsten Titanium Sputtering Targets
Tungsten Titanium Sputtering Targets
Attributes Name
Special Alloy Sputtering Targets
Product Name
Tungsten Titanium Sputtering Targets
Element Symbol
W + Ti
Purity
3N5, 4N, 4N5
Shape
Planar
Tungsten Titanium(WTi)alloy Sputtering Target Description


Tungsten Titanium Sputtering Targets are produced by powder metallurgy technology, and widely used for semiconductor and thin film solar cells.


Tungsten Titanium Sputtering Targets are produced by powder metallurgy technology which are widely used for semiconductor and thin film solar cells.

For semiconductor application, WTi10wt% thin film is used as diffusion barrier and adhesion layer, to separate the metallization layers from semiconductor, for instance, separate aluminum from silicon, or copper from silicon. Thus, the function of semiconductor in microchips can be improved significantly.

For thin film solar cells, WTi10wt% thin film is also used as barrier layer to prevent iron atoms in steel substrate diffuse to molybdenum back contact and CIGS semiconductor.Tungsten Titanium targets are also used for LED and tool coating.

Our factory can produce WTi 90/10wt%, WTi 85/15wt% target, and special composition target can be customized, the actual targets' density > 99%, and average grain size: < 100um. With up to 4N5 purity and special annealing treatment, uniform grain size as well as lower gas content, end user can obtain constant erosion rates and high pure and homogeneous thin film coating during PVD process.







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