Changsha Xinkng Advanced MaterialsCo.,Ltd Alloy Sputtering Target Molybdenum Niobium Sputtering Target
Molybdenum Niobium Sputtering Target
Molybdenum Niobium Sputtering Target
Attributes Name
Special Alloy Sputtering Targets
Product Name
Molybdenum Niobium Sputtering Target
Element Symbol
Mo+Nb
Purity
3N5
Shape
Plane target,Heteromorphic customization
Molybdenum Niobium(MoNb) alloy sputtering Target Description


The molybdenum-niobium (MoNb) alloy target is gray in shape and has a square target with a purity of 99.95%. It is prepared by a powder process, and the general niobium content is about 5-10%. The molybdenum-niobium alloy target is first uniformly mixed with two ultra-pure metal powders of molybdenum powder and niobium powder, and then the powder is pressed and sintered, and then the uniform densification process is carried out, and then the target is made by machining processing such as surface grinding and polishing. material. In the touch screen group, molybdenum and niobium are mainly used for the metal wiring of the extremely corrosion-resistant ITO thin film sensor.

Characteristics of molybdenum-niobium alloy target
Molybdenum-niobium alloy targets have been widely used in magnetron sputtering for flat-panel displays. In the industrial application of molybdenum targets, more and more researches on molybdenum alloys have been made to further improve the corrosion resistance (discoloration) and Adhesion (film peeling). Adding V, Nb, W, and Ta to molybdenum will improve the specific resistance, stress, and corrosion resistance of the product.

Preparation process used for molybdenum-niobium alloy sputtering target
Compared with the traditional sintering process, due to our increased use of hot isostatic pressing technology, the density of the molybdenum-niobium planar target produced can reach more than 9.7g/cm3, and its uniformity, density, purity and other indicators have achieved significant results. Promote.




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