The aluminum-chromium alloy target produced by Xinkang adopts advanced hot isostatic pressing process. The products include rectangular target, arc target and large aspect ratio integrally formed tube target, etc., with a wide range of composition ratio, high purity and density, The advantages of small and uniform crystal grains and long service life. It can be adjusted freely according to customer requirements, and the actual density is close to 99%. The following is the production process of aluminum chromium target.

Raw materials - powder blending - sheathing - alloy powdering - sheath pressing - hot isostatic pressing - metallographic inspection - wire cutting - machining - dimensional inspection - cleaning-packaging

Related parameters of aluminum-chromium alloy sputtering target

Metallographic inspection of aluminum-chromium alloy sputtering target

Through repeated forging, rolling and heat treatment, we can appropriately adjust the microstructure of the target material to achieve the effect you want. If the grain size of the sputtering target material is uniform, the user can obtain a good sputtering rate and uniform coating Floor. The picture below is a microscopic metallographic inspection picture of a 30at% aluminum chromium sputtering target, with an average particle size <100μm.

Composition analysis of aluminum-chromium alloy sputtering target

We produce aluminum-titanium sputtering targets. Its most important advantages are high purity and density, small and uniform crystal grains, and long service life. The following table is a typical composition analysis certificate of 2N8 aluminum chromium 30at% sputtering target. Analysis method: 1. Use ICP-OES to analyze metal elements; 2. Use LECO to analyze gas elements.