Boron sputtering target is made of pure boron, which is a semimetal of main Group 13 (IIIa, or boron group) of the periodic table. Pure crystalline boron is a black, lustrous semiconductor; i.e., it conducts electricity like a metal at high temperatures and is almost an insulator at low temperatures. It is hard enough (9.3 on Mohs scale) to scratch some abrasives, such as carborundum, but too brittle for use in tools.

Application of Boron (B) Sputtering Target 

Limited quantities of elemental boron are widely used to increase hardness in steel. Added as the iron alloy ferroboron, it is present in many steels, usually in the range 0.001 to 0.005 percent. Boron is also used in the nonferrous-metals industry, generally as a deoxidizer, in copper-base alloys and high-conductance copper as a degasifier, and in aluminum castings to refine the grain. In the semiconductor industry, small, carefully controlled amounts of boron are added as a doping agent to silicon and germanium to modify electrical conductivity.

Typical certificate of analysis of 3N Boron (B) Sputtering Target

Boron sputtering target is manufactured by hot press technology, with purity 99.5 to 99.9%, here is a typical certificate of 3N pure boron sputtering target.

Related Sputtering Materials

 BN sputtering target

B4C sputtering target

LaB6 sputtering target

SmB6 sputtering target

TiB2 sputtering target

ZrB2 sputtering target

CrB2 sputtering target

Mo2B5 sputtering target

CoFeB sputtering target