Changsha Xinkng Advanced MaterialsCo.,Ltd Metal Sputtering Targets Cobalt Sputtering Target
Cobalt Sputtering Target
Cobalt Sputtering Target
Attributes Name
High purity metal sputtering target
Product Name
Cobalt Sputtering Target
Element Symbol
Co
Purity
3N5
Shape
Planar target, Rotary target
Cobalt( Co)Sputtering Target Description


Cobalt( Co)sputtering target has the same properties as metallic cobalt,Like nickel,cobalt is found in the Earth's crust only in chemically combined form, save for small deposits found in alloys of natural meteoric iron. The free element, produced by reductive smelting, is a hard, lustrous, silver-gray metal. Cobalt is a ferromagnetic metal with a specific gravity of 8.9. The Curie temperature is 1,115 °C (2,039 °F) and the magnetic moment is 1.6–1.7 Bohr magnetons per atom. Cobalt has a relative permeability two-thirds that of iron.

Cobalt with a purity of 99.9-99.99% has been widely used in the manufacture of magnetic materials and superalloys, and cobalt sputtering targets with 99.999% or higher purity are applied for advanced electronic components. The high-purity cobalt sputtering targets manufactured by Xinkang is mainly used in magnetic recording, magnetic sensor and photoelectric fileds.

The microstructure can be adjusted by our flexibility production process, to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. Following are two micrographs of our cobalt sputtering target, the average grain size<100μm.




Cobalt(

Co  )sputtering target Co sputtering target


Our high purity sputtering target can make the film possess an outstanding level of electrical conductivity and minimize the particle formation during the PVD process. Following is a typical certificate of analysis for 3N5 cobalt sputtering target.

Analytical Methods:
1. Metallic elements were analyzed by GDMS and ICP-OES.
2. Gas elements were analyzed by LECO.




Co sputtering target


Cobalt sputtering target preparation process
Material Preparation - Vacuum Induction Melting - Chemical Analysis - Forging-Rolling - Annealing - Metallographic Inspection - Machining - Dimensional Inspection - Cleaning - Final Inspection - Packaging.

Other alloy forms of cobalt sputtering target
Aluminum-cobalt alloy, cobalt-nickel alloy, cobalt-iron alloy, chromium-cobalt alloy, cobalt-based doped tantalum, platinum, niobium, zirconium, boron, rhodium, etc.



Iron Sputtering Target
Silver sputtering target