Changsha Xinkng Advanced MaterialsCo.,Ltd Metal Sputtering Targets Niobium Sputtering Target
Niobium Sputtering Target
Niobium Sputtering Target
Attributes Name
High purity metal sputtering target
Product Name
Niobium Sputtering Target
Element Symbol
Nb
Purity
3N, 3N5
Shape
Planar target, Rotary target
Niobium( Nb)Sputtering Target Description


The niobium sputtering target has the same function as its raw material. Niobium is a strong, light grey, crystalline, and ductile transition metal. Pure Niobium has a hardness similar to that of pure titanium, and it has similar ductility to iron.Niobium is used in various superconducting materials. These superconducting alloys, also containing titanium and tin, are widely used in the superconducting magnets of MRI scanners. Other applications of niobium include welding, nuclear industries, electronics, optics, numismatics, and jewelry.

Niobium Sputtering Target is produced by EB melting technology, it's usually applied for touch screen, optical lenses and glass coatingusually applied for touch screen, optical lenses and glass coating.

XK is a professional producer of Niobium sputtering targets with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics industry. Thanks to our special forming processes, our Niobium sputtering targets possess higher density, smaller average particle size as well as high purity, so that you can benefit from a faster process due to higher sputtering speed and obtain very homogeneous Niobium layers.

The microstructure can be adjusted by our flexibility production process, to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. Following are two micrographs of our niobium sputtering target, the average grain size<100μm.




niobium sputtering target 

Nb  sputtering target


The chemical purity is crucial to a metal sputtering targets, if the purity is higher, the films you obtained possess an more outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of aThe chemical purity is crucial to a metal sputtering target, if the purity is higher, the films will possess a more outstanding level of electrical conductivity and minimized particle formation during the PVD process. Following is a typically Certificate of analysis for 3N5 Molybdenum sputtering target.

Analytical Methods:
1. Metallic elements were analyzed by GDMS and ICP-OES.
2. Gas elements were analyzed by LECO.



Nb  sputtering target


Preparation process of niobium sputtering target
Material Preparation-Forging-Machining-Rolling-Heat Treatment-Metallographic Inspection-Machining-Dimension Inspection-Cleaning-Final Inspection-Packaging

Niobium tube target and preparation method thereof
First, the niobium tube blank is hot-extruded, and then the hot-extruded niobium tube blank is processed into the inner hole to obtain the niobium tube target blank. In the process of preparing the niobium tube target, firstly, the surface of the niobium tube blank is smeared with glass powder. Because the surface of the niobium tube blank is sprayed with glass powder, it has a better lubricating effect during the extrusion process. The surface quality is better; the subsequent hot extrusion and heat treatment help to refine and homogenize the grains of the niobium tube blank; finally, the extruded niobium tube blank is machined, and the niobium tube blank is processed by special tools. The inner hole is boring and milling, so that the chip can be continuously discharged from the inner hole, avoiding the problem of the accumulation of the chip in the inner hole and affecting the surface processing of the inner hole, thereby obtaining a niobium target material with uniform internal grains and low surface roughness. .

The use of niobium sputtering target
Niobium and niobium alloy targets are mainly used in surface engineering materials, such as shipbuilding, chemical industry, liquid crystal display (LCD), heat-resistant, corrosion-resistant and high-conductivity coating industries, thin-film solar industry, low-e glass industry, flat panel display industry, optical coating Industry, tools and decorative coating industry.

Other alloy forms of niobium sputtering target
Niobium-tantalum, niobium-zirconium alloy targets, etc.



Molybdenum Sputtering Targets
Tantalum Sputtering Target