Changsha Xinkng Advanced MaterialsCo.,Ltd Alloy Sputtering Target Nickel tungsten sputtering target
Nickel tungsten sputtering target
Nickel tungsten sputtering target
Attributes Name
Nickel Alloy Sputtering Targets
Product Name
Nickel tungsten sputtering target
Element Symbol
Ni + W
Purity
3N、3N5
Shape
Planar sputtering target
Nickel tungsten (NiW) alloy sputtering target


Nickel tungsten target is a typical alloy target. Nickel-tungsten alloy has low resistivity, good thermal stability and oxidation resistance; at the same time, it has the characteristics of good processing performance and high toughness. Therefore, mixed powder of tungsten and nickel As raw materials for sputtering targets, nickel-tungsten tube targets made of these two materials have become one of the most used tube targets in the semiconductor field.


Preparation method of nickel tungsten alloy target
Preparation of the target material provides tungsten and nickel mixed powder (mass ratio of 9.95:1 to 10.05:1), the tungsten and nickel mixed powder adopts cold isostatic pressing process, tungsten and nickel mixed powder and stainless steel hollow tube are densified for the first time Forming semi-dense tungsten and nickel mixed powder and stainless steel initial blanks, so that the subsequent hot isostatic pressing process can better densify tungsten and nickel mixed powder and stainless steel initial blanks.

Application field of nickel tungsten alloy target
Nickel tungsten cemented carbide has the characteristics of high strength, high hardness, excellent wear resistance, heat resistance and good corrosion resistance, so it is widely used in high pressure, high speed, high temperature, corrosive media and other working environments.






Nickel titanium sputtering target