Zinc sputtering target has the same characteristics as its raw material. Zinc is a chemical element with the symbol Zn and atomic number 30. it is a silver-white, bluish metal,at room temperature,it is brittle,when 100 ~ 150℃,it is soft;above 200℃,it becomes dry again.It has active chemical property,at normal temperature in air, there is a thin and dense basic zinc carbonate film on the surface, which to prevent further oxidation,when the temperature is above 225℃,it is oxidized severely.

Metal zinc can be made into excellent alloys, mainly in the form of galvanized, zinc-based alloy, zinc oxide widely used in automobile, construction, household appliances, ships, light industry, machinery, batteries and other industries. Galvanizing refers to the surface treatment technology of plating a layer of zinc on the surface of metal, alloy or other material for the purpose of beauty and rust prevention.

Application of Zinc sputtering target

Zinc Sputtering Target is produced by melting technology, it is normally used for depositing ZnO thin film, which can be luminescent film of LED and OLED products, or transparent conducting film of OLED products and anti-reflection film of thin-film solar cells. With up to 4N purity and special annealing treatment, uniform grain size, lower gas content,we can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

Following is a typically Certificate of analysis of 4N Zinc Sputtering Target.

Analytical Methods:
1. Metallic elements were analyzed by ICP-OES;
2. Gas elements were analyzed by LECO.

Zinc target preparation process
Preparation - Melting - Chemical Analysis - Forging - Rolling - Annealing - Metallographic Inspection - Machining - Dimensional Inspection - Cleaning - Final Inspection - Packaging

Other alloy forms of zinc sputtering target
Zinc aluminum, zinc tin and zinc copper alloy sputtering targets, etc.