Production of the micro-electronic elements must retain features of large production scale, small physical dimension and small performance variance, since the purity and uniformity of the material are all required for producing the thin film of the final product. In addition, precision ingredient combinations also significantly affect the thin film electronic properties of these products. Based on this concern, apart from developing high purity target, XK also aims at the additive arrangement of the alloy element as well as the uniformity of content texture that explores many know-how technologies to support sputtering targets employed in micro-electronics.
XK possesses the capacity for developing and manufacturing target made by dual alloy and many other ternary alloys and even higher, and hot rolling process are precisely controlled to guarantee uniform microstructure.
XK is a professional manufacturing factory for superior metal and metal alloy sputtering targets as well as evaporation materials, we are focus on providing the most suitable and high quality thin film materials for our customers. Our regular products applied in semiconductor & electronics are in below form, if you have special request, please contact our sales engineer for more information.
Vanadium Sputtering Target
Iron Sputtering Target
Cobalt Sputtering Target
Niobium Sputtering Target
Tantalum Sputtering Target
Tungsten Sputtering Target
Nickel Sputtering Target
Titanium Sputtering Target
Aluminum Sputtering Target
Copper Sputtering Target
Nickel Vanadium Sputtering Target
Nickel Iron Sputtering Target
Nickel chromium sputtering target
Target Question and Answer
Metal Sputtering Targets
Alloy Sputtering Target
Factory Aaddress：Building A4-1, Innovation and Pioneer Park, Yongtai Road, High-Tech Development Zone, Changsha City, Hunan Province, China
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Address：Building A4-1, Innovation and Pioneer Park, Yongtai Road, High-Tech Development Zone, Changsha City, Hunan Province, China
Copyright © 2014 xk-sputteringtarget.com