Production of the micro-electronic elements must retain features of large production scale, small physical dimension and small performance variance, since the purity and uniformity of the material are all required for producing the thin film of the final product. In addition, precision ingredient combinations also significantly affect the thin film electronic properties of these products. Based on this concern, apart from developing high purity target, XK also aims at the additive arrangement of the alloy element as well as the uniformity of content texture that explores many know-how technologies to support sputtering targets employed in micro-electronics.

XK possesses the capacity for developing and manufacturing target made by dual alloy and many other ternary alloys and even higher, and hot rolling process are precisely controlled to guarantee uniform microstructure.

XK is a professional manufacturing factory for superior metal and metal alloy sputtering targets as well as evaporation materials, we are focus on providing the most suitable and high quality thin film materials for our customers. Our regular products applied in semiconductor & electronics are in below form, if you have special request, please contact our sales engineer for more information.