XK is specialized in manufacturing pure chromium sputtering targets with various purity and dimension, which are widely applied to tool coating, decorative coating, glass coating and integrated circuits. Chromium arc cathodes normally applied for decorative and tool coating, to obtain a thin film of metal color.
Thanks to the special forming processes we used, the actual density of chromium sputtering targets are up to 99%, so that our customers benefit from a faster process due to higher sputtering speeds.
The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two micrographs of our chromium sputtering target, the average grain size around 100μm, fine and uniform grains, compact inner structure without void.
The sputtering targets we produced are high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 3N5 Chromium sputtering target.
Analytical Methods: 1. Metallic elements were analyzed using ICP-OES. 2. Gas elements were analyzed using LECO.