Recently, the high-tech enterprise certification management network announced that Hunan Changsha Xinkang New Material Technology Co., Ltd.

Magnetron sputtering is developed on the basis of two-pole sputtering. A magnetic field orthogonal to the electric field is established on the surface of the target, which solves the problems of low deposition rate of two-pole sputtering and low plasma ionization rate. It has become the mainstay of the coating industry. One of the methods.

Magnetron sputtering target poisoning treatment method, the target with intermediate frequency source or RF source hit one or two hours, can be recovered; the target removed, with sandpaper polishing, can also be solved.

Determine the target material and gas type, and then adjust its various parameters to prepare a color film

Magnetron sputtering is a kind of physical vapor deposition. Magnetron sputtering increases the plasma density and sputtering rate by introducing a magnetic field on the cathode surface of the target... ...