Welcome to Changsha Xinkng Advanced MaterialsCo.,Ltd,a professional producer of sputtering targets

Tantalum Sputtering Target

Tantalum Sputtering Target,spu

Product Name

Tantalum Sputtering Target

Element Symbol

Ta

Purity

3N5, 4N

Availble Shape

Planar target, Rotary target


Process


XK is a professional producer of Tantalum sputtering targets with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics industry. Thanks to the special forming processes we used, our Tantalum sputtering targets possess higher density, smaller average particle size as well as high purity, as a result, you can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous Tantalum layers.

Micrograph

The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The picture below are two typical micrographs of our Tantalum sputtering target, the average grain size<100μm.
















Analysis

The chemical purity is crucial to a metal sputtering targets, if the purity is higher, the films you obtained possess an more outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 3N5 high purity Tantalum sputtering target.
Analytical Methods: 1. Metallic elements were analyzed using ICP-OES. 2. Gas elements were analyzed using LECO. 




Related Products