Welcome to Changsha Xinkng Advanced MaterialsCo.,Ltd,a professional producer of sputtering targets

Tungsten Sputtering Target

Tungsten,sputtering target,spu

Product Name

Tungsten Sputtering Target

Element Symbol

W

Purity

3N5

Availble Shape

Planar target, Rotary target


Process


XK has rich experience in producing tungsten sputtering target with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics. As a component of the thin-film transistors used in TFT-LCD screens, tungsten layers is extremely stable under high temperature environment, due to the highest melting point of all metals. Thanks to the special forming processes we used, our tungsten sputtering targets possess higher density, smaller average particle size as well as high purity, as a result, you can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous tungsten layers.


Micrograph

The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. The average grain size of our tungsten sputtering target are all less than 100μmyou can benefit from constant erosion rates and homogeneous layers.
















Analysis

The chemical purity is crucial to a metal sputtering targets, if the purity is higher, the films you obtained possess an more outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 3N5 high purity Tungsten sputtering target.
Analytical Methods: 1. Metallic elements were analyzed using ICP-OES. 2. Gas elements were analyzed using LECO. 




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