Aluminium Neodymium (AlNd) Sputtering Target
  • Attributes Name
    Alloy Sputtering Target
  • Product Name
    Aluminium Neodymium Sputtering Target
  • Element Symbol
    AlNd
  • Purity
    3N,4N
  • Shape
    Planar
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Description
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Aluminum neodymium alloy is a commonly used magnetron sputtering target. Aluminum has a melting point of 660℃, density of 2.7, and thermal conductivity of 0.53, while neodymium has a melting point of 1024℃, density of 7.0, and thermal conductivity of 0.031. Due to their great differences in melting point, density and thermal conductivity, if produce it directly adopt vacuum melting method, it easily generates segregation and splashes in the melting process, causing pollution, resulting in uneven alloy structure and high impurity content, which seriously affects the alloy quality. 

The aluminum neodymium alloy target produced by Xinkang has the characteristics of high purity, high density, uniform internal structure and small grain size.

Chemical Specification:


The form below is a typical certificate of 99.9% pure AlNd 97/3wt% sputtering target:


Related Sputtering Materials


AlNd 97/3wt% Sputtering Target

AlNd 99.4/0.6wt% Sputtering Target

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