Boron (B) Sputtering Target
  • Attributes Name
    Ceramic Sputtering Target
  • Product Name
    Boron sputtering target
  • Element Symbol
    B
  • Purity
    3N
  • Shape
    Planar
Request a Quote
Or Cal +86-731-84027969
Description
Reviews
Xinkang can produce and supply full range of ceramic sputtering targets and compound targets, including oxide sputtering targets, carbide sputtering targets, fluoride sputtering targets, sulfide sputtering targets and so on. The production technology of ceramic sputtering targets are hot press. From the selection of raw materials to the control of temperature, pressure and time of hot press sintering, we strictly follow the specific production process, thus the finished ceramic sputtering targets have the characteristics of high purity, high density, uniform surface color without spots and crack, the end user can obtain constant erosion rates and high pure and homogeneous thin films during PVD process.

Boron Sputtering Target
Purity: 99.9%;
Production Method: hot press sintering
Available dimensions:
Circular: Diameter = 3 mm;
Rectangular: Length = 3 mm.
Type of Bond: Indium, Elastomer. 

Related Sputtering Materials


CoFeB sputtering target

BN sputtering target

B4C sputtering target

TaB2 sputtering target

WB2 sputtering target

LaB6 sputtering target

MoB2 sputtering target

TiB2 sputtering target

Comments
Leave a Comment
Your email address will not be published. Required fields are marked *
Your Name*
Your Email*
Submit Comment
You May Also Looking For…
Talk to Our Expert About Your Needs !
Request a Quote
Ceramic Sputtering Targets | Xinkang Materials
Enter your inquiry details, We will reply you in 24 hours
Submit Request
Document