Hafnium(Hf)Sputtering Target
  • Attributes Name
    Metal sputtering target
  • Product Name
    Hafnium Sputtering Target
  • Element Symbol
    Hf
  • Purity
    2N4,3N,3N5
  • Shape
    Planar
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Description
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Hafnium sputtering target has the same performance as metal hafnium (Hf). Hafnium with melting point of 2233°C, boiling point of 4603°C, and density of 13.31g/cm3. It is a shiny silver-gray transition metal. Metal hafnium has moderate strength, good corrosion resistance, and high neutron absorption capacity. It is widely used in the atomic energy industry; hafnium can form a variety of alloys and can also be used as a surface coating for base metals. We can provide imported high-purity hafnium with low-zirconium, which can be processed into targets and particles.

Application of hafnium sputtering target
By introducing the partial pressure of oxygen, the hafnium oxide film can be prepared by electric sputtering or reactive sputtering with hafnium sputtering target. The resulting thin film can be used in a variety of applications, including optical coatings for photonics, thin film resistance, corrosion resistance, nuclear products, gate insulators in integrated circuits, and sensors.

Chemical Specification:


The form below is a typical certificate of 99.95% pure Hafnium Hf sputtering target:


Related Sputtering Materials


NiHf sputtering target

NbHfTi  sputtering target

HfO2 sputtering target

HfC sputtering target

HfB2 sputtering target

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