Iron (Fe) Sputtering Target - Xinkang Materials

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Iron (Fe) Sputtering Target

Attributes Name

High purity metal sputtering target
Product Name

Iron Sputtering Target
Element Symbol

Fe
Purity

3N,3N5,4N
Shape

Planar target, Rotary target

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Description

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High-purity iron（ Fe） sputtering target is an important material for preparing magnetic recording media, magnetic recording write heads, optoelectronic devices and magnetic sensors.

The microstructure can be adjusted by our flexibility production process, to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. Following are two micrographs of our iron sputtering target, the average grain size＜100μm.

Chemical Specification:

Our high purity sputtering target can make the film possess an outstanding level of electrical conductivity and minimize the particle formation during the PVD process. Following is a typical certificate of analysis for 4N iron sputtering target:

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