Zinc (Zn) Sputtering Target
  • Attributes Name
    High purity metal sputtering target
  • Product Name
    Zinc Sputtering Target
  • Element Symbol
    Zn
  • Purity
    3N5, 4N, 5N
  • Shape
    Planar target
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Description
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Zinc sputtering target has the same characteristics as its raw material. Zinc is a chemical element with the symbol Zn and atomic number 30. it is a silver-white, bluish metal,at room temperature,it is brittle,when 100 ~ 150℃,it is soft;above 200℃,it becomes dry again.It has active chemical property,at normal temperature in air, there is a thin and dense basic zinc carbonate film on the surface, which to prevent further oxidation,when the temperature is above 225℃,it is oxidized severely.

Metal zinc can be made into excellent alloys, mainly in the form of galvanized, zinc-based alloy, zinc oxide widely used in automobile, construction, household appliances, ships, light industry, machinery, batteries and other industries. Galvanizing refers to the surface treatment technology of plating a layer of zinc on the surface of metal, alloy or other material for the purpose of beauty and rust prevention.

Zinc Sputtering Target is produced by melting technology, it is normally used for depositing ZnO thin film, which can be luminescent film of LED and OLED products, or transparent conducting film of OLED products and anti-reflection film of thin-film solar cells. With up to 4N purity and special annealing treatment, uniform grain size, lower gas content,we can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

Chemical Specification:


Our high purity sputtering target can make the film possess an outstanding level of electrical conductivity and minimize the particle formation during the PVD process. The form below is a typical certificate of 99.99% pure Zinc Sputtering Target:


Related Sputtering Materials


ZnSn Sputtering Target

ZnAl Sputtering Target

CuZn Sputtering Target

ZnO Sputtering Target

ZnS Sputtering Target
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