Zirconium(Zr)Sputtering Target
  • Attributes Name
    High purity metal sputtering target
  • Product Name
    Zirconium Sputtering Target
  • Element Symbol
    Zr
  • Purity
    2N4, 3N5
  • Shape
    Planar target, Rotary target
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Description
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Zirconium sputtering target has the same properties as its raw material. Its density is 6.49g/cc, melting point is 1852℃, and vapor pressure is 10 -4 Torr at 1987℃. It is a shiny, off-white, strong transition metal, very similar to hafnium and to a lesser extent similar to titanium. Zirconium is mainly used as a refractory material and opacifier, but a small amount of zirconium is used as an alloying agent because of its strong corrosion resistance.

Zirconium Sputtering Target is produced by melting technology, normally used for decorative coating and optical coating. High pure Zirconium Sputtering Targets contain very low Hafnium is normally applied for optical field, we supply standard Hf and Zr targets for Leybold coating equipment.

While zirconium sputtering targets and zirconium arc cathodes with lower purity are used for making gold color films. With up to 99.4% purity, uniform grain size, lower impurity content, end user can obtain good hardness, high brightness, corrosion and oxidation resistant color without discolour or tarnish for a very long time. We have been supplying Zirconium Sputtering Target or Zirconium arc cathodes for manufacturers of watch, sanitary ware, car mirrors, etc, which are suitable for various magnetron sputtering machines and ion plating machines.

Chemical Specification:


Our high purity sputtering target can make the film possess an outstanding level of electrical conductivity and minimize the particle formation during the PVD process. The form below is a typical certificate of 99.95% pure zirconium Sputtering Target:


Related Sputtering Materials


ZrY Sputtering Target

TiZr Sputtering Target

ZrO2 Sputtering Target

ZrB2 Sputtering Target

HfZrO2 Sputtering Target
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