.png)
.png)
.png)
.png)
Sputtering targets are the core consumables used in Physical Vapor Deposition (PVD), a thin-film coating process essential to modern electronics, optics, aerospace systems, medical devices, and advanced manufacturing. From semiconductor wafers and solar panels to functional coatings on optical components, sputtering targets define the material composition, purity, and performance of the final thin film.
As technology advances into the AI era, demand for high-purity metals, alloys, precious metals, and specialty compound sputtering targets continues to rise. In 2025, the United States remains one of the most influential centers of thin-film innovation, supported by strong material science research, semiconductor reshoring, and a robust industrial ecosystem.
This article highlights the Top 10 Sputtering Targets Manufacturers in the USA for 2025, based on technical capabilities, material purity, customization capacity, industry reputation, and customer support. Although the manufacturer profiles will be introduced later, this article provides the essential market background and evaluation framework to help buyers, engineers, and procurement teams choose the right supplier.
Sputtering targets are foundational to producing functional thin films in industries undergoing rapid transformation. With semiconductor devices shifting toward smaller nodes, display technologies moving toward micro-LED and OLED, and aerospace/optics demanding ultra-high-purity coatings, target suppliers must evolve quickly.
High-performance devices now require sputtering targets that deliver:
Higher purity and traceability
Precise compositional uniformity
Custom alloy formulations
Advanced bonding and large-area coating solutions
These requirements are reshaping the competitive landscape and raising the technical thresholds manufacturers must meet.
Several factors are pushing demand for U.S.-based sputtering targets:
1. Semiconductor Reshoring
Massive investments in U.S. chip manufacturing (CHIPS Act) intensify demand for local, high-purity sputtering targets.
2. Rise of AI and HPC Hardware
Advanced chips need ultra-clean thin-film materials for interconnects, barrier layers, and specialized coatings.
3. Next-Generation Display Technology
Micro-LED, flexible displays, and quantum-dot films require new alloy and oxide target materials.
4. Electrification and Automotive Sensors
EV battery components, lidar, and optical sensors require sputtered thin films.
5. Aerospace & Defense Applications
Precision coatings for optics, sensors, and reflective surfaces rely on U.S.-made high-purity materials.
The USA offers advantages that global manufacturers value:
Strong material science research infrastructure
Robust quality systems and certification compliance
Shorter supply chains and faster lead times
Enhanced stability in geopolitical or logistical disruptions
For companies seeking reliability and consistent purity levels, U.S. sputtering target suppliers continue to be top choices.
To objectively evaluate sputtering targets manufacturers in the USA, this report considers several key criteria:
A top supplier must offer:
Ultra-high-purity metals (e.g., Al, Cu, Ti, W)
Precious metals (Au, Pt, Ag, Pd, Ir)
Alloys and customized formulations
Oxides, nitrides, and specialty compounds
High-density and low-oxygen content materials
Critical capabilities include:
Advanced hot pressing and vacuum melting
Bonded targets for high-power sputtering
Large-area rectangular targets
High uniformity and microstructure control
Clean-room-level manufacturing environments
Leading manufacturers support:
Prototype quantities
Specialty alloys
Tailored compositions
Unique shapes and sizes
Backing plate integration
Top companies comply with:
ISO 9001 / ISO 14001
Traceability and statistical process control
On-demand COA/COC documentation
High purity and impurity reporting
A strong manufacturer will offer:
Fast domestic delivery
Export support
Engineering consultation
Bonding, recoating, and refurbishing services
These criteria ensure a comprehensive assessment of reliability, capability, and technical depth.
Company Overview:
Changsha Xinkang Advanced Materials Co., Ltd., established in 2014 and headquartered in Changsha, Hunan, China, stands as a premier sputtering targets manufacturer specializing in PVD coating materials. As a high-tech enterprise, Xinkang delivers over 1,000 variants of sputtering targets and evaporation materials through its 3,900㎡ state-of-the-art workshop, serving global industries with one-stop solutions for vacuum coating applications. With exports to Korea, Japan, Europe, and the Middle East, the company emphasizes high-purity metallic, alloy, and ceramic targets, ensuring reliable supply chains and rapid customization within 2-4 weeks.
Xinkang holds ISO 9001, ISO 14001, and IATF16949 certifications, upholding stringent quality controls via advanced equipment like vacuum induction furnaces and ICP-OES analyzers. Trusted by leading PVD coating enterprises, universities, and research institutes, it has forged over five-year partnerships with most clients. Ranked among the top sputtering targets manufacturers worldwide, Xinkang excels in producing targets with purities up to 99.9995%, supporting sustainable practices in thin-film deposition.
With a decade of expertise, Xinkang caters to diverse sectors including semiconductors (high-purity targets for microelectronics), flat panel displays (uniform large-area coatings), solar photovoltaics (Al, Cu, Mo, Cr, ITO, AZO targets for thin-film cells), glass coatings (Cr, Ti, Si, Ni, Al, Cu, Zn, Ag alloys), decorative coatings (Cr, Ti, Zr, Ni, W, Ti-Al for aesthetics), and protective hard coatings (Al-Ti, Ti, Cr, Zr, Ti-Si for durability). Real-world applications demonstrate enhanced film uniformity and adhesion in automotive and green energy projects.
Xinkang's 52-member team, founded by three seasoned metal materials engineers and comprising skilled technicians and R&D specialists, drives continuous innovation in sputtering targets manufacturing. Equipped with sintering furnaces, CNC machining centers, and metallographic microscopes, the team advances PVD processes, focusing on eco-friendly evaporation sources and custom bonding techniques to meet evolving vacuum coating demands.
Key Products and Services:
Titanium Sputtering Target: 99.99% purity metal targets with indium bonding service for semiconductor PVD coating.
Aluminum Rotary Sputtering Target: 99.9995% high-purity rotary targets and elastomer bonding for flat panel display evaporation.
CuInGa Alloy Sputtering Target: Copper-based alloy targets with e-beam welding service for solar photovoltaic thin-film deposition.
NiCr Alloy Sputtering Target: Nickel-chromium alloy targets and custom machining for protective hard coating applications.
Company Overview:
Founded in 1954 and headquartered in Jefferson Hills, Pennsylvania, USA, Kurt J. Lesker Company (KJLC) is a woman-owned and operated global leader in vacuum technology and thin film deposition solutions. With over 70 years of operation, KJLC has evolved from a regional distributor into a worldwide provider of high-quality vacuum products, systems, and materials, serving more than 100,000 customers across seven global facilities and employing over 400 dedicated professionals. As a premier sputtering targets manufacturer, the company specializes in enabling innovations in advanced materials processing for industries like semiconductors, optics, electronics, aerospace, solar, and R&D.
KJLC holds ISO 9001:2015 certification for its manufacturing processes, ensuring rigorous quality control in sputtering targets production and vacuum system assembly. Key achievements include a 2023 U.S. Patent (US 11,631,571B2) for ultra-high purity conditions in atomic layer deposition, enhancing atomic-scale processing precision. The company has earned accolades such as the 2023 Sussex Business Awards for Large Business and Company of the Year, and its President & CEO, Kurt J. Lesker IV, was named Entrepreneur of the Year® East Central. These milestones underscore KJLC's commitment to excellence as a trusted sputtering targets manufacturer.
With seven decades of expertise in physical vapor deposition (PVD) and sputtering targets manufacturing, KJLC supports high-volume production and cutting-edge research. Notable cases include supplying the Lab-Line sputter tool to UMass's Emerging Technologies and Innovation Center for versatile thin film research, delivering uniform coatings to Fudan University's physics lab for reproducible high-quality films, and enabling perovskite solar cell prototyping at the University of Oxford with the Mini-SPECTROS system. In the UK, KJLC's connectivity upgrades via Beaming improved data transfer speeds by 500 times, streamlining global operations for vacuum product deployment in LEDs and automotive applications.
Led by Owner and Chairwoman Cindy Lesker alongside a team of 30+ skilled engineers and innovators, KJLC fosters a collaborative culture emphasizing SPIRIT values for sustainability and ethical advancement. The R&D-focused staff drives breakthroughs like the eKLipse deposition software and AI ethics workshops with partners such as Johns Hopkins. As a sputtering targets manufacturer, KJLC innovates through in-house bonding, precious metals reclamation, and custom high-purity materials to meet evolving demands in ALD and PVD.
Key Products and Services:
Sputtering Targets: Custom high-purity manufacturing and bonding services
Evaporation Materials: Precious metals reclamation and sourcing services
Crucible Liners: Thermal and e-beam evaporation process support services
Company Overview:
SCI Engineered Materials, Inc. (OTCQB: SCIA), founded in 1987 as Superconductive Components, Inc. by Dr. Edward Funk and Ingeborg Funk, is a leading global sputtering targets manufacturer specializing in advanced materials for physical vapor deposition (PVD) thin film applications. Headquartered in Columbus, Ohio, the company went public in 1989 and rebranded in 2007 after strategic mergers, now operating from a 32,000 sq ft facility established in 2004. With 11-50 employees, SCI serves over 40 countries, delivering high-purity ceramic and metal targets essential for industries like semiconductors, photonics, precision optics, solar energy, storage media, and thin-film batteries. Its mission focuses on precision-engineered solutions for vacuum evaporation and thin film deposition processes, ensuring reliability in demanding PVD environments.
As a certified public company, SCI adheres to rigorous SEC reporting standards, including audited 10-K and 10-Q filings, demonstrating financial transparency and governance excellence. Key achievements include a Board-authorized share repurchase program in November 2025, underscoring market confidence, and participation in prestigious events like SVC TechCon and The Advanced Materials Show for showcasing sputtering targets innovations. The company's expertise in high-purity materials has earned it recognition as a trusted partner for OEMs in microelectronics and renewable energy sectors.
With over 35 years in sputtering targets manufacturing, SCI has honed capabilities in custom fabrication, supporting complex PVD thin film deposition for next-gen applications like MRAM data storage and high-k dielectrics. Notable experience includes producing one-piece targets up to 20 inches in diameter for laser ablation and e-beam systems, as well as tile arrays spanning 3 meters for large-scale vacuum evaporation projects. While specific client case studies are proprietary, SCI's involvement in the Ohio Third Frontier Photovoltaic Program highlights successful deployments in thin-film solar coatings, enhancing efficiency in renewable energy production.
SCI's multidisciplinary team, led by experienced executives with deep roots in materials science, drives innovation through in-house processes like vacuum hot pressing and precision machining for exotic alloys. Recent highlights include employee-led capstone projects in facilities engineering and community outreach by leadership, fostering a culture of continuous improvement. Innovation centers on developing ultra-dense, custom sputtering targets for emerging technologies, such as ruthenium for advanced microelectronics, positioning SCI at the forefront of PVD advancements.
Key Products and Services:
Sputtering Targets: High-purity metal and ceramic options for thin film deposition in semiconductors and optics.
Evaporation Materials: Specialized granules and slugs for vacuum evaporation in precision coatings.
Ceramic Powders: Custom formulations for target fabrication via PVD processes.
Company Overview:
Linde Advanced Material Technologies (Linde AMT), a global leader among sputtering targets manufacturers, specializes in high-purity physical vapor deposition (PVD) materials for advanced electronics and industrial applications. With over 50 years of expertise, the company delivers innovative solutions in powder metallurgy and casting processes, serving sectors like semiconductors, automotive, 5G communications, flat panel displays, and photovoltaic cells. Headquartered in Orangeburg, New York, with facilities in the US, France, and Korea, Linde AMT ensures vertical integration for reliable supply chains, producing sputtering targets that enable thin-film deposition for next-generation devices.
As one of the few sputtering targets manufacturers capable of meeting semiconductor-grade purity standards (up to 6N for copper alloys), Linde AMT holds a reputation for excellence in microstructure control and homogeneity. Key achievements include the development of a 6N copper refining line for sustainable, high-quality PVD targets, reducing in-film particle generation and extending sputter life. The company adheres to best-in-class safety and quality protocols, with continuous facility investments—like the 2024 expansion of its Cheonan, Korea plant—enhancing capacity for global demands.
Linde AMT's legacy traces back to the 1970s global expansions, including the 1978 Toulouse facility and 1997 Cheonan plant, evolving through acquisitions by Sony in 1989 and Praxair in 1999. Proven in high-volume production, it supplies top semiconductor fabs with consistent tantalum and titanium sputtering targets, achieving stable performance across target lifetimes. Case in point: Customized copper-manganese alloys for logic and memory chips have optimized Rs uniformity in 5G and cloud computing applications, demonstrating adaptability amid supply chain fluctuations.
Linde AMT's multidisciplinary team of materials scientists and engineers drives R&D collaborations with OEMs and customers, pioneering new sputtering targets materials like lanthanum and scandium for advanced nodes. Innovation focuses on sustainable practices, such as eco-friendly copper production, and prototyping via dedicated model shops to scale custom designs rapidly. This forward-thinking approach fosters breakthroughs in PVD efficiency, positioning the company at the forefront of sputtering targets manufacturing evolution.
Best Products:
Tantalum Sputtering Targets: High-purity (5N8) deposition for barrier layers in semiconductors.
Copper Alloy Sputtering Targets: 6N refined for interconnects in 5G and memory devices.
Aluminum Alloy Sputtering Targets: 5N5 controlled chemistry for flat panel displays.
Titanium Sputtering Targets: 5N stable performance for photovoltaic and automotive coatings.
Tungsten Alloy Sputtering Targets: 5N homogeneous microstructure for advanced logic applications.
Company Overview:
American Elements, founded in 1997 by Michael Silver in Santa Monica, California, is the world's largest manufacturer dedicated exclusively to advanced materials, including high-purity sputtering targets for physical vapor deposition (PVD) and chemical vapor deposition (CVD) applications. With over 35,000 products in its catalog, the company specializes in metals, alloys, ceramics, and composites essential for semiconductors, electronics, aerospace, and green technologies. As a global sputtering targets manufacturer, American Elements produces ultra-high purity (99.9%–99.9999%) deposition materials using vacuum melt/casting and hot isostatic pressing (HIP) techniques, serving research labs, industrial clients, and Fortune 50 companies across multiple continents.
Certified under ISO 9001, ISO 14001, and OHSAS 18001 standards, American Elements ensures rigorous quality control through documented statistical processes and advanced analytics like XRF, GDMS, and ICP. Its achievements include partnerships with the U.S. military and 30% of Fortune 50 firms, co-sponsorship of the PBS Nova "Making Stuff" series on materials science, and publication of the annual Endangered Elements List to highlight supply chain risks for high-tech manufacturing. These efforts underscore its role as a trusted sputtering targets manufacturer delivering consistent, certified materials for demanding deposition processes.
With over two decades of experience, American Elements has evolved from toll chemical refining for U.S. mines to pioneering rare-earth exports from China post-1999, enabling domestic high-purity sputtering targets production. Case studies highlight innovations like gadolinium nitrate neutron getters for nuclear reactors and nanoscale zinc oxide antimicrobials for textiles, demonstrating scalable sputtering targets manufacturing for energy, defense, and pharmaceuticals. Global facilities in the U.S., Mexico, China, and the UK support custom deposition solutions, from rotatable targets for large-area coatings to research-sized alloys for solar and fuel cell applications.
Led by CEO Michael Silver, an expert in rare-earth geopolitics, the team comprises materials science "Inventologists" with backgrounds from GE CRD and Bell Labs, fostering entrepreneurial R&D. Innovations include rare-earth dry-film lubricants for high-pressure environments and LLZO electrolytes for lithium-sulfur batteries, advancing sputtering targets as key enablers for next-gen electronics and nanotechnology.
Key Sputtering Targets Products and Services:
Aluminum Sputtering Target: Custom high-density monoblock or bonded configurations for semiconductor interconnects.
Titanium Sputtering Target: Ultra-pure rotatable variants for aerospace barrier layers and PVD coatings.
Copper Sputtering Target: Alloyed options with beveling for RF/DC sputtering in electronics manufacturing.
Gold Sputtering Target: High-purity granular forms for optical thin-film deposition services.
Silicon Oxide Sputtering Target: HIP-pressed plates for CVD display and fuel cell applications.
Company Overview:
Plasmaterials, Inc., established in 1987 and headquartered in Fremont, California, stands as a leading sputtering targets manufacturer specializing in high-purity materials for physical vapor deposition (PVD) and thin film deposition processes. With a diversified portfolio, the company supplies planar and rotatable sputtering targets, evaporation materials, and related components to the global thin film industry, catering to R&D, pilot production, and full-scale manufacturing needs. Serving diverse sectors such as microelectronics, architectural glass coatings, display technology, transparent conductive films, semiconductor alloys, optical coatings, packaging, automotive hard coatings, and decorative anti-corrosive applications, Plasmaterials ensures state-of-the-art materials from nearly every element on the periodic table, including custom alloys and composites produced via vacuum casting or powder metallurgy.
As a corporate sponsor of the Society of Vacuum Coaters, Plasmaterials upholds rigorous standards in high-purity fabrication, offering materials from commercial grade to zone-refined Ultra-Pure levels for demanding PVD applications. Recognized among the top 10 global sputtering targets manufacturers in 2025, the company excels in precision engineering, with proprietary metallic bonding services using low-vapor-pressure materials to enhance thermal conductivity and target integrity.
Boasting over 37 years of expertise in sputtering targets manufacturing, Plasmaterials has supported thin film deposition innovations across industries, from large-area architectural glass alloys to high-purity semiconductor targets used in academic and industrial research, such as lithium phosphate films for solid-state batteries and transition-metal carbide multilayers for advanced electronics. Their materials feature in peer-reviewed studies on surface silanization and electrochemical interfaces, demonstrating reliability in real-world PVD sputtering scenarios.
Supported by a dedicated team of sales engineers and manufacturing specialists, Plasmaterials drives innovation through enhanced-design sputtering targets that achieve near-100% utilization by inverting erosion profiles for extended longevity—nearly double that of standard planar targets. Key advancements include rotary cathode sputtering targets fabricated via continuous casting, hot isostatic pressing (HIP), and plasma spraying directly onto cooling plates, alongside a full-service precious metals reclamation program to promote sustainable thin film deposition practices.
Featured Products and Services:
Aluminum Sputtering Target: Custom high-purity fabrication for microelectronics thin film deposition.
Silicon Sputtering Target: Doped boron or phosphorus variants for semiconductor PVD coatings.
Chromium Sputtering Target: Alloy configurations for decorative and anti-corrosive evaporation materials.
Gold Sputtering Targets: Precious metal options with bonding services for optical and transparent conductive films.
Company Overview:
MSE Supplies LLC, founded in 2014 and headquartered in Tucson, Arizona, is a U.S.-based leading supplier of advanced materials, laboratory equipment, and analytical services for research and production. As a trusted sputtering targets manufacturer, the company specializes in high-purity metal sputtering targets, alloy sputtering targets, and ceramic sputtering targets, serving over 5,000 research labs and 20,000+ global customers, including Fortune 500 firms, national labs, and startups. With a mission to "We Enable Innovation," MSE Supplies empowers scientists and engineers in thin-film deposition, battery research, semiconductors, and biosensors by providing standard and custom sputtering targets solutions at competitive value.
MSE Supplies sources products from ISO 9001-certified manufacturers and holds corporate membership in The American Ceramic Society. The company has raised $15.6M in funding and forged key partnerships, such as distributing Moorfield's nanoPVD and nanoCVD tools in the U.S. Renowned for reliability, it earns praise from clients like NASA materials scientists for superior quality and rapid delivery, positioning it among the top 10 sputtering targets suppliers in 2025.
With over a decade of expertise in sputtering targets manufacturing, MSE Supplies supports diverse applications, from lithium battery R&D to engineering prototypes. Case studies highlight collaborations with energy storage innovators, delivering custom oxide ceramic sputtering targets for solid-state electrolytes, and aiding academic labs in fabricating nitride ceramic sputtering targets for advanced coatings—accelerating projects with timely, high-purity deliveries.
The core technical team, comprising PhD-level scientists and engineers with 10+ years in R&D and production, drives innovation through in-house customization and advanced analytical services like surface characterization and pore structure analysis. Sales and logistics experts ensure seamless global support, while ongoing hiring fuels growth in sputtering targets fabrication and emerging tech.
Key Sputtering Targets Products and Services:
High-Purity Metal Sputtering Targets: Custom fabrication for thin-film applications
Alloy Sputtering Targets: Tailored compositions for semiconductor deposition
Ceramic Sputtering Targets: Specialized oxide and nitride variants with purity certification
Custom Sputtering Targets: Bespoke design and bonding services for R&D prototypes
Company Overview:
Vacuum Engineering & Materials (VEM), founded in 1987 and headquartered in Santa Clara, California, in the heart of Silicon Valley, stands as a leading U.S.-based sputtering targets manufacturer and global supplier of high-purity physical vapor deposition (PVD) materials. With over 38 years of expertise, VEM serves more than 350 customers across semiconductor, RF wireless, optics, photovoltaic, MEMS, life sciences, aerospace & defense, consumer-mobility, and clean energy industries, delivering sputtering targets and evaporation materials spanning the periodic table for precision thin film deposition processes. The company's state-of-the-art Dallas, Texas facility supports advanced manufacturing and services, ensuring reliable, on-demand delivery to minimize production downtime.
As a trusted sputtering targets manufacturer, VEM holds a strong reputation for quality, evidenced by sales of over 105,000 sputtering targets and the creation of 1,200 custom part numbers. Recognized in 2025's Top 10 Sputtering Target Manufacturing Companies, VEM excels in purities from 99.9% to 99.999+%, supporting 150-450mm wafer platforms with geometries like round, rectangular, ConMag, Delta, Ring, rotatable, and multi-tiled designs. Key achievements include internal promotions—Sarah Sallstrom to Director of Engineering for her innovation leadership and Manoj Rebba to Quality Manager for excellence in standards—and participation in industry events like the GaAs Mantech Conference.
VEM's decades of experience as a sputtering targets manufacturer shine in real-world applications, such as advanced packaging for redistribution layers, barrier films, and passivation, as well as data storage for hard disk drives and magnetic recording media. The company has cleaned 97,000 chamber components via precision ultrasonic and plasma spray services, reducing fab downtime and extending tool life, while its precious metals reclamation program recovers critical materials for sustainable reinvestment.
VEM's 51-200-member team, including technical experts like Dr. ShinHwa Li, drives innovation through proprietary processes such as the Ultra Pure Au Process, which boosts yield and uptime in gold-based sputtering targets. This experienced group develops custom PVD solutions, fostering proactive client partnerships and advancing thin film deposition technologies.
Key Products and Services:
High-Purity Sputtering Targets: Custom fabrication in metals like copper, aluminum, nickel, gold, palladium for PVD systems
Alloy Sputtering Targets: Aluminum and copper alloys for semiconductor thin film deposition
ITO Sputtering Targets: Indium tin oxide variants for display and photovoltaic applications
Indium Bonding Services: High-purity assembly for sputtering target durability and thermal conductivity
Company Overview:
Materion Corporation, a global leader in advanced materials solutions and a premier sputtering targets manufacturer, was founded in 1931 in Cleveland, Ohio, with roots tracing back to 1921 when it pioneered beryllium extraction. Headquartered in Mayfield Heights, Ohio, the company operates over 30 facilities worldwide, employing more than 3,400 skilled professionals to serve high-growth markets like semiconductors, aerospace, automotive, and clean energy. As a top sputtering targets manufacturer, Materion's Electronic Materials segment—accounting for over 70% of its business—specializes in thin-film deposition materials, including the industry's broadest portfolio of specialty sputtering targets in precious and non-precious metals and alloys. In 2023, it reported record value-added sales of $1.13 billion, underscoring its role in enabling innovations for AI chips and next-generation semiconductors.
Certified under rigorous standards like ISO 45001 for safety, Materion excels as a sputtering targets manufacturer with unmatched material purity and control, offering high-purity source materials that minimize defects like spitting. Key achievements include supplying beryllium-based materials for NASA's James Webb Space Telescope mirror (delivered 2005) and Alan Shepard's 1961 space capsule re-entry surface, plus recent acquisitions like HC Starck's tantalum operations to bolster capacity for AI-driven chips. The company holds patents for innovative technologies and maintains world-class labs for analytical testing, earning recognition as a sustainable growth leader in manufacturing.
With over 25 years in large-area sputtering targets production, Materion has delivered rotatable and planar targets for uniform coatings in glass, displays, and semiconductors, supporting applications from data storage to power management. Notable cases include partnerships with Idaho National Laboratory for nuclear microreactors and U.S. government contracts for additive manufacturing in aerospace, generating $90 million in new space propulsion orders. Its PVD magnetron sputtering services enable short-run testing for custom solutions, ensuring reproducibility in high-volume production.
Materion's diverse team fosters innovation through R&D, with employee resource groups promoting inclusion and professional development programs building expertise in engineering and operations. Innovations like patented VCT™ sputtering targets reduce grain size for superior performance, alongside expansions in non-beryllium alloys for wear-resistant applications and LiDAR optics for autonomous vehicles. This forward-thinking approach drives breakthroughs in fusion energy and connectivity.
Key Sputtering Targets Products and Services:
Gold Sputtering Targets: custom thin film coatings for power semiconductors, communications, and optoelectronics
Tantalum Sputtering Targets: high-purity plates for logic chips and advanced memory applications
Precious and Non-Precious Metal Sputtering Targets: alloy compositions for data storage and RF devices
Large-Area Sputtering Targets: rotatable and planar designs for glass and display coatings
Company Overview:
Goodfellow Cambridge Ltd., established in 1946 and headquartered in Huntingdon, UK, stands as a premier global supplier of advanced materials, with a strong emphasis on high-purity sputtering targets for thin film deposition processes. Serving over 111 countries, the company offers more than 170,000 products, including metals, alloys, ceramics, polymers, compounds, and composites in forms like foils, powders, rods, and wires. As a trusted sputtering targets manufacturer, Goodfellow specializes in materials up to 99.999% (5N) purity, engineered for electronics, optics, and aerospace applications. With no minimum order policy and 99% of items dispatched within 48 hours, it supports R&D to industrial-scale needs, bolstered by its 2024 acquisition of Potomac Photonics for enhanced micromanufacturing.
ISO 9001 certified for quality assurance, Goodfellow excels as a sputtering targets manufacturer with in-house capabilities like sputtering, electroplating, and heat treatments. Key achievements include supplying materials for landmark projects such as the Cassini-Huygens probe to Saturn's moons and breakthroughs in nuclear fusion research, demonstrating its role in advancing thin film deposition technologies.
With over 75 years of expertise, Goodfellow has collaborated on diverse applications, including custom shadow masks for sub-micron features in 2D materials testing at the University of Houston-Clear Lake, enabling precise thin film deposition. Its materials have powered cochlear implants and supported global innovations in semiconductors and energy storage, underscoring reliability in sputtering targets manufacturing for high-stakes projects.
Goodfellow's 51-200 strong team of materials scientists and engineers drives progress through the "Innovation Discussed" podcast, exploring AI-accelerated developments like self-healing polymers and ultra-pure steels. Initiatives such as the Green Production Initiative promote sustainable thin film deposition, while custom solutions foster breakthroughs in sputtering targets for fusion energy and plasma-based therapies.
Key Products and Services:
High-Purity Sputtering Targets: Custom fabrication for thin film deposition
Carbon Sputtering Targets: Coating applications in electronics
Silicon Sputtering Targets: Physical vapor deposition for semiconductors
Cobalt Sputtering Targets: Magnetic thin film layers
Alumina Sputtering Targets: Optical and ceramic coatings
Selecting the right supplier involves more than comparing prices. For engineers, R&D labs, and industrial procurement teams, performance, repeatability, and consistency matter far more.
Different applications demand different levels of purity:
Semiconductor-grade targets
Optical and photonic coatings
Wear-resistant industrial coatings
R&D prototype materials
Clear specifications lead to better supplier matching.
Critical parameters:
Disk, rectangular, ring, rotary, or large-area targets
Bonded vs. monolithic targets
Thickness, flatness, density, and grain structure
Backing plate materials and thermal compatibility
For fast-paced industries:
Short manufacturing cycles
Custom alloy development
Rapid prototyping
Reclaiming and recycling of precious metals
These factors reduce downtime and total cost of ownership.
Thin-film performance depends on target consistency. Reliable suppliers offer:
Full impurity analysis
Batch-to-batch repeatability
Comprehensive QC documentation
Manufacturers with strong engineering teams can help optimize:
Sputtering rates
Film composition uniformity
Target utilization efficiency
This support is crucial for high-precision applications.
Sputtering targets are central to the advancement of modern technology, from high-end semiconductor devices to advanced optical coatings. The United States plays a crucial role in this industry, providing reliable, high-quality manufacturers with strong technical capabilities, traceability, and supply stability.
Choosing the right sputtering target manufacturer requires careful consideration of material purity, customization flexibility, quality control, and overall technical strength. As the demand for high-performance thin films grows across electronics, aerospace, automotive, and energy sectors, U.S.-based suppliers will remain essential partners in enabling next-generation innovations.
The detailed profiles of the Top 10 Sputtering Targets Manufacturers in the USA will be added next, providing a comprehensive comparison to support your sourcing and engineering decisions.
How to Make Sputtering Target?
Making a sputtering target involves several steps to create a high-quality material that can be used for thin film deposition processes. Sputtering targets are typically used in physical vapor deposition (PVD) techniques to deposit thin films onto substrates.
Top 10 Sputtering Target Manufacturer in World 2025
Sputtering is a physical vapor deposition (PVD) process used for depositing materials onto a substrate, by ejecting atoms from sputtering targets and condensing the ejected atoms onto a substrate in a high vacuum environment.
Top 10 Custom Sputtering Target Manufacturers in 2025
Custom sputtering targets are designed to meet the specific needs of a particular application. They can be made from a variety of materials, with different shapes and sizes. Custom sputtering targets are often used in research and development, as well as in industrial applications.
Top 10 Sputtering Target Suppliers In Europe 2023
Sputtering targets are critical in various industries including semiconductor manufacturing, display technology, solar cells, optical coatings, magnetic storage media, aerospace, automotive and research.
.png)
.png)
.png)
Hot Article